Backed by catalytic and adsorption purification technologies from Chengdu Organic Chemicals Co., Ltd., Chinese Academy of Sciences (COCC), we offer a complete product portfolio covering Ar, N₂, H₂, O₂, and noble gases.
Dual-tower duty/standby design · Catalytic adsorption and regeneration process covering Ar, N₂, H₂, O₂, and noble gases—from laboratory point-of-use purification to centralized gas stations, with zero-consumable operation.

Multiple models paired with OES and ICP spectrometers; over 3,000 units deployed, reducing high-purity argon costs.
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Dual-tower multi-port valve design requiring no hydrogen or vacuum for regeneration, for deep purification of metallurgical shielding gas.
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Accepts feed H₂ with up to 1,000 ppm O₂—low-cost industrial hydrogen serves as feed gas for electronics, semiconductors, and optical fiber.
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Purifies cylinder industrial O₂ into high-purity oxygen; pairs with IR carbon-sulfur analyzers for electronics, optical fiber, and analytical instruments.
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Dual pre-adsorption towers cascaded with a high-temperature alloy N₂-removal tower, achieving ≤ 0.2 ppm residual N₂ for semiconductor-grade requirements.
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Five-zone precision temperature control covering Ar / He / Ne / Kr / Xe across the full spectrum, delivering up to 6N ultra-high purity.
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One-touch start/stop, automatic regeneration and tower switching, modular detachable structure, dynamic touchscreen display, and zero-consumable operation.
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Closed-chamber gas purification, recirculation, and regeneration up to 99.9998% purity, ideal for closed-loop noble gas recovery.
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Skid-mounted centralized supply feeding multiple units; turnkey delivery of main unit, piping/valves, and online analyzers for chip and new-energy lines.
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Line-end composite purifier column for five gases; purity > 99.9999%, 10 MPa pressure rating, factory regeneration supported.
View Details ›On-site recirculating purification of laboratory air, specifically removing H₂S and VOCs without modifying exhaust ductwork.
SPE pure-water electrolysis for H₂ generation with a four-stage purification train outputting 7N–8N ultra-pure hydrogen, fully replacing high-pressure lab H₂ cylinders.
| Product Series | Representative Model | Applicable Gas | Feed Gas Purity & Allowable Impurities | Output Gas Purity | Key Residual Impurity Specs | Flow Range | Typical Applications |
|---|---|---|---|---|---|---|---|
| Fully Automatic Gas Purifier | CZA/N/H/O-4ZT |
Ar / N₂ / H₂ / O₂ | ≥99.9%; O₂, H₂O ≤ 1000 ppm | ≥ 99.9998% | O₂ ≤ 0.5 ppm, dew point ≤ -72 °C, CO+CO₂ ≤ 0.1 ppm | 1 ~ 200 Nm³/h | Unattended laboratories, high-end analysis & continuous production lines |
| Argon Purifier | CZA-B / C / D / Z |
Ar | ≥99.9%; O₂, H₂O < 1000 ppm | ≥ 99.9998% | O₂ ≤ 0.5 ppm, H₂O ≤ 2 ppm (dew point ≤ -72 °C) | 1 ~ 200 Nm³/h | OES spectrometers, ICP-OES, metallurgy, advanced materials |
| Nitrogen Purifier | CZN-B / C / Z |
N₂ | ≥99.9%; O₂, H₂O ≤ 1000 ppm | ≥ 99.9998% | O₂ ≤ 0.5 ppm, H₂O ≤ 2 ppm (dew point ≤ -72 °C) | 1 ~ 500 Nm³/h | Metallurgical heat-treatment shielding gas, electronics & semiconductor packaging |
| Hydrogen Purifier | CZH-B / C / Z |
H₂ | ≥99.9%; O₂, H₂O < 1000 ppm | ≥ 99.9998% | O₂ ≤ 0.5 ppm, H₂O ≤ 2 ppm (dew point ≤ -72 °C) | 1 ~ 500 Nm³/h | Electronics, optical fiber, powder metallurgy, chemical catalytic hydrogenation |
| Oxygen Purifier | CZO-B / C / Z |
O₂ | ≥ 99.9%; H₂ ≤ 1000 ppm, HC/COₓ ≤ 60 ppm | ≥ 99.9998% | H₂ ≤ 0.1 ppm, HC/CO+CO₂ ≤ 0.1 ppm, dew point ≤ -72 °C | 1 ~ 100 Nm³/h | High-frequency IR carbon-sulfur analyzers, optical fiber, semiconductor oxidation |
| Ultra-High Purity Purifier (N₂ Removal) | CZA-4N-2 |
Ar | ≥ 99.9%; O₂ < 200 ppm, N₂ < 200 ppm | ≥ 99.9999% | O₂ ≤ 0.2 ppm, N₂ ≤ 0.2 ppm, dew point ≤ -76 °C | 1 ~ 200 Nm³/h | Lithium batteries, semiconductors & spectroscopy requiring deep N₂ removal |
| Inert Gas Purifier | CZA-4N / FX-Z |
Ar / He / Ne / Kr / Xe | ≥ 99.9%; O₂ < 200 ppm, N₂ < 200 ppm | ≥ 99.9999% (6N) | O₂ ≤ 0.2 ppm, N₂ ≤ 0.2 ppm, dew point ≤ -76 °C | 1 ~ 200 Nm³/h | Semiconductor specialty gases, optical fiber, ultra-purification of noble gases |
| Recirculating Regenerative Purifier | XZ / CZH-C·Z |
Ar/N₂/He/H₂/O₂/Ne/Kr/Xe | Recovered tail gas ≥ 99.9%; O₂/H₂O ≤ 1000 ppm | ≥ 99.9998% | O₂ ≤ 1 ppm, H₂O ≤ 2 ppm (dew point ≤ -72 °C) | 1 ~ 500 Nm³/h | Closed chambers, gloveboxes, closed-loop noble gas recovery |
| High-Flow Gas Purifier | Custom Skid-Mounted Gas Station | Ar / H₂ / N₂ | Liquid storage tank gas, pipeline gas, or cylinder manifolds | ≥ 99.9998% | Customized by process; supports online dew point / O₂ analyzer interlocks | 30 ~ 50+ m³/h | Wafer fabs, new-energy lines, centralized foundry gas supply stations |
| Gas Purifier Column | CJX-YDG |
N₂ / H₂ / Ar / He / Air | >99.9%; O₂, H₂O < 500 ppm | > 99.9999% (6N) | O₂ ≤ 0.5 ppm, H₂O ≤ 1 ppm (dew point ≤ -76 °C) | 5 ~ 50 L/min | Analytical instrument front-end, MFC line-end point-of-use polishing |
| Ultra-Pure Hydrogen Generator NEW | HW-300/500/1000 |
H₂ (Water Electrolysis) | Deionized water ≥ 2 MΩ·cm | 7N ~ 8N | Deep removal of O₂, H₂O, N₂, CO, CO₂, hydrocarbons | 300 ~ 1000 mL/min | Gas chromatography, semiconductors, optical fiber, hydrogen energy testing |
| Laboratory Air Purifier NEW | CZAPF-A15 / A30 |
Indoor Laboratory Air | Contains H₂S, alkanes/alkenes/aromatics, organic sulfur | CADR 180/550 m³/h | H₂S breakthrough capacity ≥ 50 mg/g, VOCs removal ≥ 95% | 220 / 680 m³/h | Petroleum geology, core analysis, organic synthesis laboratories |